Fabrication of silicon nanocrystallites by oxidation/annealing of polysilane films and their luminescence properties

This publication has 12 references indexed in Scilit:

• Si Quantum Dot Formation with Low-Pressure Chemical Vapor Deposition
  Japanese Journal of Applied Physics, 1996
• Stable Visible Photoluminescence from Annealed Polysiloxene-Based Thin Films
  MRS Proceedings, 1995
• Visible photoluminescence in Si+-implanted thermal oxide films on crystalline Si
  Applied Physics Letters, 1994
• Light emitting nanocrystalline silicon prepared by dry processing: The effect of crystallite size
  Applied Physics Letters, 1993
• Luminescence from Thermally Oxidized Porous Silicon
  Japanese Journal of Applied Physics, 1993
• Visible Photoluminescence from Si Microcrystalline Particles^*
  Japanese Journal of Applied Physics, 1993
• Rapid-thermal-oxidized porous Si−The superior photoluminescent Si
  Applied Physics Letters, 1992
• Visible Photoluminescence from Si Microcrystals Embedded in SiO₂ Glass Films
  Japanese Journal of Applied Physics, 1992
• Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers
  Applied Physics Letters, 1990
• Quantum size effects on photoluminescence in ultrafine Si particles
  Applied Physics Letters, 1990