Chemical processing with lasers: Recent developments
- 1 July 1988
- journal article
- research article
- Published by Springer Nature in Applied Physics B Laser and Optics
- Vol. 46 (3) , 261-270
- https://doi.org/10.1007/bf00692884
Abstract
No abstract availableKeywords
This publication has 15 references indexed in Scilit:
- Laser-induced surface reduction of the high-T c superconductor YBa2Cu3O7?xApplied Physics A, 1988
- Laser-induced chemical etching of silicon in chlorine atmosphereApplied Physics A, 1988
- Influence of the beam spot size on ablation rates in pulsed-laser processingApplied Physics Letters, 1987
- Excimer-laser-induced etching of ceramic PbTi1−xZrxO3Journal of Applied Physics, 1987
- Kr+ laser-induced chemical vapor deposition of WJournal of Applied Physics, 1987
- Laser-induced chemical etching of silicon in chlorine atmosphereApplied Physics A, 1987
- Kinetics of Laser-Induced Pyrolytic Chemical Processes and the Problem of Temperature MeasurementsPublished by Springer Nature ,1987
- Laser-induced surface metallization of ceramic PLZTApplied Physics A, 1986
- Chemical Processing with LasersPublished by Springer Nature ,1986
- Laser-Induced Chemical Vapor DepositionPublished by Springer Nature ,1984