Incorporation and thermal stability of hydrogen in amorphous silicon and germanium
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 40-45
- https://doi.org/10.1016/0022-3093(95)00652-4
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
- Hydrogen dynamics in a-Si:H: Multiple trapping, structural relaxation, and the Meyer-Neldel relationPhysical Review B, 1991
- Hydrogen stability in amorphous germanium filmsPhilosophical Magazine Part B, 1991
- Hydrogen diffusion in amorphous siliconPhilosophical Magazine Part B, 1987
- Thermal equilibration in doped amorphous siliconPhysical Review B, 1986
- The role of hydrogen in a-Si:H — results of evolution and annealing studiesJournal of Non-Crystalline Solids, 1983
- A SIMS analysis of deuterium diffusion in hydrogenated amorphous siliconApplied Physics Letters, 1978