A SIMS study of ion-assisted etching mechanisms; adsorbed fluorine on Si removed by ion bombardment
- 2 December 1982
- journal article
- Published by Elsevier in Surface Science
- Vol. 123 (2-3) , 427-438
- https://doi.org/10.1016/0039-6028(82)90338-7
Abstract
No abstract availableThis publication has 26 references indexed in Scilit:
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