Preparation of free-standing films of anodic tantalum oxide
- 15 March 1974
- journal article
- Published by Elsevier in Nuclear Instruments and Methods
- Vol. 116 (1) , 195-196
- https://doi.org/10.1016/0029-554x(74)90601-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Microanalysis of Materials by Backscattering SpectrometryScience, 1972
- A Very Precise Sectioning Method for Measuring Concentration Profiles in Anodic Tantalum OxideJournal of the Electrochemical Society, 1972
- Analysis of amorphous layers on silicon by backscattering and channeling effect measurementsSurface Science, 1970
- Preparation and Some Characteristics of Self-Supporting 300–2500 Å Oxide FilmsJournal of Vacuum Science and Technology, 1969
- Absorption Spectra of Anodic Tantalum Oxide FilmsThe Journal of Chemical Physics, 1961