The structure and electromigration behaviour of aluminium films deposited by the partially ionized beam technique
- 1 May 1993
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 227 (1) , 54-58
- https://doi.org/10.1016/0040-6090(93)90186-s
Abstract
No abstract availableKeywords
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