Highly doped implanted donor layers in laser annealed gallium arsenide
- 1 January 1980
- journal article
- Published by Taylor & Francis in Radiation Effects
- Vol. 47 (1-4) , 81-84
- https://doi.org/10.1080/00337578008209191
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Annealing of Te-implanted GaAs by ruby laser irradiationApplied Physics Letters, 1978
- Amorphous-polycrystal transition induced by laser pulse in self-ion implanted siliconApplied Physics A, 1977
- Low-dose n-type ion implantation into Cr-doped GaAs substratesSolid-State Electronics, 1977
- Heating of solid targets with laser pulsesJournal of Applied Physics, 1975
- Electrical and cathodoluminescence measurements on ion implanted donor layers in GaAsSolid-State Electronics, 1975
- Quantum-Transport Theories and Multiple Scattering in Doped Semiconductors. II. Mobility of-type Gallium ArsenidePhysical Review B, 1967
- Heavy doped n-type single crystal epitaxial layers of gallium arsenideSolid-State Electronics, 1964