Kelvin Probe Force Microscopy Images of Microstructured Organosilane Self-Assembled Monolayers
- 1 June 2001
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 40 (6S)
- https://doi.org/10.1143/jjap.40.4373
Abstract
A difference in surface potentials between organosilane self-assembled monolayers (SAMs) was measured by means of Kelvin probe force microscopy (KFM). The SAMs were deposited on a single Si substrate from alkylsilane, that is, octadecyltrimethoxysilane (ODS) [H3C(CH2)17Si(OCH3)3], and fluoroalkylsilane (FAS), that is, heptadecafluoro-1,1,2,2-tetrahydro-decyl-1-trimethoxysilane [F3C(CF2)7(CH2)2Si(OCH3)3]. The locations of these SAMs on the substrate were defined by means of a photolithographic technique. The regions terminated with ODS and FAS were clearly distinguished by KFM with the surface potential difference between the ODS- and FAS-terminated surfaces under optimized imaging conditions. The surface potential of the FAS-terminated region was 170∼180 mV lower than the potential of the ODS-terminated surface. The origin of such a low surface potential of FAS-SAM was ascribed to the larger dipole moment of the FAS molecule induced by the electron negativity of F atoms as estimated from a molecular orbital calculation.Keywords
This publication has 15 references indexed in Scilit:
- Surface Potential Images of Microstructured Organosilane Self-Assembled Monolayers Acquired by Kelvin Probe Force MicroscopyJapanese Journal of Applied Physics, 2001
- Formation mechanism of n-octadecyltrichlorosilane monolayer prepared at the air/water interfaceColloids and Surfaces A: Physicochemical and Engineering Aspects, 2000
- Micropatterning of Alkyl- and Fluoroalkylsilane Self-Assembled Monolayers Using Vacuum Ultraviolet LightLangmuir, 2000
- Photodegradation of Organosilane Self-assembled Monolayers Irradiated with an Excimer Lamp.Journal of Photopolymer Science and Technology, 2000
- Kelvin Probe Force Microscopy on Surfaces: Investigation of the Surface Potential of Self-Assembled Monolayers on GoldLangmuir, 1999
- Fluoroalkylsilane Monolayers Formed by Chemical Vapor Surface Modification on Hydroxylated Oxide SurfacesLangmuir, 1999
- Electric field induced structural change for poly(vinylidene fluoride-co-trifluoroethylene) ultrathin films studied by scanning Maxwell stress microscopeJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1998
- Organosilane Monolayer Resists for Scanning Probe Lithography.Journal of Photopolymer Science and Technology, 1997
- Scanning maxwell stress microscope for nanometre-scale surface electrostatic imaging of thin filmsThin Solid Films, 1994
- Atomic force microscope–force mapping and profiling on a sub 100-Å scaleJournal of Applied Physics, 1987