Study of Contamination Rates in an Electron Microscope
- 1 November 1963
- journal article
- Published by AIP Publishing in Review of Scientific Instruments
- Vol. 34 (11) , 1213-1215
- https://doi.org/10.1063/1.1718179
Abstract
A study of contamination rates in a Hitachi HU-11 electron microscope under various conditions was made. A decontamination device is described which lowers the contamination rate by more than a factor of two. The construction of this apparatus is such that accessories like a multiaxis tilting stage and specimen tensile straining device can be used concurrently.Keywords
This publication has 4 references indexed in Scilit:
- The movement of dislocations during the observation of metal films inside an electron microscopePhilosophical Magazine, 1962
- Formation of Thin Polymer Films by Electron BombardmentJournal of Applied Physics, 1960
- The sources of electron-induced contamination in kinetic vacuum systemsBritish Journal of Applied Physics, 1954
- The origin of specimen contamination in the electron microscopeBritish Journal of Applied Physics, 1953