A Review of infrared spectroscopic studies of vapor-deposited dielectric glass films on silicon
- 1 April 1976
- journal article
- review article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 5 (2) , 113-160
- https://doi.org/10.1007/bf02652900
Abstract
No abstract availableKeywords
This publication has 90 references indexed in Scilit:
- Analytical Infrared Spectra of Particulate Alpha-AluminasPublished by Springer Nature ,1970
- Far-Infrared Spectra of Inorganic Nitrate and Chloride Glasses, Liquids, and Crystals: Complex Ions or Optical Phonons?The Journal of Chemical Physics, 1969
- Dielectric Materials in Semiconductor DevicesJournal of Vacuum Science and Technology, 1969
- Chemical and Structural Evaluation of Thin Glass FilmsPublished by Springer Nature ,1969
- The silicon-silicon dioxide systemProceedings of the IEEE, 1969
- Spectra of phosphorus compounds—III The vibrational assignment and force constants of P4O6 and P4O10Spectrochimica Acta Part A: Molecular Spectroscopy, 1968
- The Preparation and Properties of Amorphous Silicon Nitride FilmsJournal of the Electrochemical Society, 1967
- Effect of an Electric Field on Silicon OxidationThe Journal of Chemical Physics, 1962
- A Method for the Deposition of SiO[sub 2] at Low TemperaturesJournal of the Electrochemical Society, 1961
- Infrared studies on polymorphs of silicon dioxide and germanium dioxideJournal of Research of the National Bureau of Standards, 1958