Mechanisms of hot-carrier induced degradation of SOI (SIMOX) MOSFET's
- 31 August 1993
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 22 (1-4) , 403-406
- https://doi.org/10.1016/0167-9317(93)90198-e
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Aging analysis of nMOS of a 1.3- mu m partially depleted SIMOX SOI technology comparison with a 1.3- mu m bulk technologyIEEE Transactions on Electron Devices, 1993
- Interface characterization of fully depleted SOI MOSFETs by the dynamic transconductance techniqueIEEE Electron Device Letters, 1991
- The generation and characterization of electron and hole traps created by hole injection during low gate voltage hot-carrier stressing of n-MOS transistorsIEEE Transactions on Electron Devices, 1990
- Two-dimensional modeling of locally damaged short-channel MOSFET's operating in the linear regionIEEE Transactions on Electron Devices, 1987