The influence of argon addition on the deposition and properties of Si:H, Cl films prepared in a glow discharge
- 1 January 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 135 (2) , 245-250
- https://doi.org/10.1016/0040-6090(86)90131-8
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
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