Intrinsic microcrystalline silicon (μc-Si:H) deposited by VHF-GD (very high frequency-glow discharge): a new material for photovoltaics and optoelectronics
- 14 January 2000
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 69-70, 219-226
- https://doi.org/10.1016/s0921-5107(99)00299-8
Abstract
No abstract availableKeywords
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