Silicon deposited by low pressure chemical vapour deposition from Si2H6: experiments, modelling and properties
- 1 February 1993
- journal article
- Published by Elsevier in Materials Science and Engineering: B
- Vol. 17 (1-3) , 72-76
- https://doi.org/10.1016/0921-5107(93)90082-x
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Two‐Dimensional Modeling of Low Pressure Chemical Vapor Deposition Hot Wall Tubular Reactors: I . Hypotheses, Methods, and First ResultsJournal of the Electrochemical Society, 1992
- Recrystallization of amorphous silicon films deposited by low-pressure chemical vapor deposition from Si2H6 gasJournal of Applied Physics, 1991
- Super Large Grain Polycrystalline Silicon Obtained from Pyrolysis of Si2H6 and AnnealingJapanese Journal of Applied Physics, 1990
- Chemical vapor deposition of silicon under reduced pressure in hot-wall reactorsChemical Engineering Science, 1986