Kinetics and mechanism of porous layer growth during n-type silicon anodization in HF solution
- 30 November 1983
- journal article
- Published by Elsevier in Surface Technology
- Vol. 20 (3) , 265-277
- https://doi.org/10.1016/0376-4583(83)90009-2
Abstract
No abstract availableThis publication has 16 references indexed in Scilit:
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