Microstructure and composition of plasma-nitrided Ti-6Al-4V layers
- 15 November 1989
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 38 (3) , 339-351
- https://doi.org/10.1016/0257-8972(89)90095-9
Abstract
No abstract availableThis publication has 7 references indexed in Scilit:
- Characteristics of R.F. plasma nitrided titanium alloysSurface and Coatings Technology, 1988
- TiNx coatings prepared by d.c. reactive magnetron sputteringThin Solid Films, 1986
- Structure and properties of TiN coatingsThin Solid Films, 1985
- The microstructure of reactively sputtered Ti-N filmsThin Solid Films, 1983
- Investigation of Tin films reactively sputtered using a sputter gunThin Solid Films, 1983
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structureThin Solid Films, 1983
- Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film compositionThin Solid Films, 1983