Étude de la cinétique de consommation d'un additif nivelant, la thiourée, durant le dépôt électrolytique
- 1 July 1967
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 12 (7) , 781-794
- https://doi.org/10.1016/0013-4686(67)80115-4
Abstract
No abstract availableKeywords
This publication has 13 references indexed in Scilit:
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- The Reduction of Coumarin in the Electrodeposition of NickelTransactions of the IMF, 1965
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- Radiotracer Study of Addition Agent Behaviour: 6—Coumarin and Melilotic AcidTransactions of the IMF, 1964
- Radiotracer Study of Addition Agent Behaviour: 5—Further Results for Thiourea, p-Toluenesulphonamide and SaccharinTransactions of the IMF, 1964
- The Uptake of Sulfur from Plating Brighteners by Copper and NickelJournal of the Electrochemical Society, 1964
- The effects of coumarin on the electrodeposition of nickelElectrochimica Acta, 1963
- Mechanism of Addition Agent Reaction in Bright and Leveling Nickel DepositionJournal of the Electrochemical Society, 1961
- The Incorporation of Sulfur in Electrodeposited Nickel, Using Thiourea as a Brightener and LevelerJournal of the Electrochemical Society, 1960
- An Investigation of the Mechanism of Levelling in ElectrodepositionTransactions of the IMF, 1956