The chemical interaction between high-concentration, mixed-ion-implanted group-III and -V impurities in silicon
- 15 July 1992
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 72 (2) , 410-421
- https://doi.org/10.1063/1.351869
Abstract
No abstract availableThis publication has 20 references indexed in Scilit:
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