Nanofabrication using inorganic resists
- 31 May 1989
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 9 (1-4) , 557-560
- https://doi.org/10.1016/0167-9317(89)90119-6
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Characterization of the lithographic properties of inorganic resists with nanometre resolution on bulk substratesMicroelectronic Engineering, 1987
- Radiolysis and resolution limits of inorganic halide resistsJournal of Vacuum Science & Technology B, 1985
- Nanometer structure fabrication using electron beam lithographyMicroelectronic Engineering, 1984
- Nanometer structure and device fabricationMicroelectronic Engineering, 1984
- Scanning transmission electron microscopy: microanalysis for the microelectronic ageJournal of Physics F: Metal Physics, 1981