Nanometer structure and device fabrication
- 1 October 1984
- journal article
- Published by Elsevier in Microelectronic Engineering
- Vol. 2 (1-3) , 82-93
- https://doi.org/10.1016/0167-9317(84)90052-2
Abstract
No abstract availableKeywords
This publication has 7 references indexed in Scilit:
- Generation of <50 nm period gratings using edge defined techniquesJournal of Vacuum Science & Technology B, 1983
- A comparison of etched-geometry and overgrown silicon permeable base transistors by two-dimensional numerical simulationsIEEE Transactions on Electron Devices, 1983
- Submicrometer periodicity gratings as artificial anisotropic dielectricsApplied Physics Letters, 1983
- Application of ≊100 Å linewidth structures fabricated by shadowing techniquesJournal of Vacuum Science and Technology, 1981
- Replication of 175-Å lines and spaces in polymethylmethacrylate using x-ray lithographyApplied Physics Letters, 1980
- X-ray lithography at ∠100 Å linewidths using x-ray masks fabricated by shadowing techniquesJournal of Vacuum Science and Technology, 1979
- Alignment of liquid crystals using submicrometer periodicity gratingsApplied Physics Letters, 1978