Investigation of the Plasma of a Magnetron Discharge during Titanium Deposition
- 1 January 1995
- journal article
- research article
- Published by Wiley in Contributions to Plasma Physics
- Vol. 35 (3) , 213-223
- https://doi.org/10.1002/ctpp.2150350305
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- On the ion energy transfer to the substrate during titanium deposition in a hollow cathode arc dischargeVacuum, 1995
- Investigation of the energy transfer to the substrate during titanium deposition in a hollow cathode arcJournal of Vacuum Science & Technology A, 1994
- Energy transfer from radio frequency sheath accelerated CF+3 and Ar+ ions to a Si waferApplied Physics Letters, 1994
- Application of dynamic in situ ellipsometry to the deposition of tin-doped indium oxide films by reactive direct-current magnetron sputteringJournal of Vacuum Science & Technology A, 1994
- Phenomena produced by ion bombardment in plasma-assisted etching environmentsJournal of Vacuum Science & Technology A, 1988
- Current–voltage relations in magnetronsJournal of Vacuum Science & Technology A, 1988
- Oberflächen- und Dünnschicht-TechnologiePublished by Springer Nature ,1987
- Modelling ion-assisted deposition of CeO2 filmsApplied Physics A, 1986
- Excitation of Atoms and Broadening of Spectral LinesPublished by Springer Nature ,1981
- Planar Magnetron SputteringPublished by Elsevier ,1978