InSb/In1−xAlxSb strained-layer superlattices grown by magnetron sputter epitaxy
- 24 February 1992
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 60 (8) , 998-1000
- https://doi.org/10.1063/1.106457
Abstract
The growth of strained‐layer superlattices of InSb/In0.6Al0.4Sb prepared by magnetron sputter epitaxy is reported for the first time. Individually controlled magnetron sputter sources of InSb, Al, and Sb were used to deposit 20‐period superlattices with periods ranging from 76 –154 Å. Layer thicknesses determined from x‐ray and cross‐sectional transmission electron microscopy (TEM) analysis were in close agreement with those predicted on the basis of the growth‐rate/deposition‐time product, indicating a high degree of deposition control. X‐ray and electron‐channeling patterns showed excellent crystallinity. The absence of surface features in the InSb cap layer indicated the layers to be under tensile stress due to the 2.1% lattice mismatch between InSb and InSb/In0.6Al0.4Sb.Keywords
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