Extension of Existing Models to Ion-Implanted MESFET's
- 1 June 1980
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Microwave Theory and Techniques
- Vol. 28 (6) , 638-647
- https://doi.org/10.1109/tmtt.1980.1130132
Abstract
No abstract availableThis publication has 15 references indexed in Scilit:
- Graded channel FET's: Improved linearity and noise figureIEEE Transactions on Electron Devices, 1978
- Profile design for distortion reduction in microwave field-effect transistorsElectronics Letters, 1978
- Bias dependence of GaAs and InP MESFET parametersIEEE Transactions on Electron Devices, 1977
- Ion-implanted threshold tailoring for insulated gate field-effect transistorsIEEE Transactions on Electron Devices, 1977
- Analysis of field distributions in a GaAs m.e.s.f.e.t. at large drain voltagesElectronics Letters, 1976
- Field distribution in junction field-effect transistors at large drain voltagesIEEE Transactions on Electron Devices, 1975
- Current saturation and small-signal characteristics of GaAs field-effect transistorsIEEE Transactions on Electron Devices, 1973
- Charge neutrality in semiconductors with implanted impurity profilesSolid-State Electronics, 1971
- Small signal properties of field effect devicesIEEE Transactions on Electron Devices, 1965
- Field-dependent mobility analysis of the field-effect transistorProceedings of the IEEE, 1965