The effect of secondary electrons in the ion plating deposition of amorphous hydrogenated carbon (a-C:H) films
- 1 January 1991
- Vol. 42 (7) , 473-476
- https://doi.org/10.1016/0042-207x(91)90019-f
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Structure of ion-plated amorphous hydrogenated carbon films investigated by electron energy loss spectroscopyThin Solid Films, 1990
- Measurements of secondary electron emission in reactive sputtering of aluminum and titanium nitrideJournal of Vacuum Science & Technology A, 1989
- A chromium carbide phase with B1 structure in thin films prepared by ion platingThin Solid Films, 1988
- Electrical characteristics and growth kinetics in discharges used for plasma deposition of amorphous carbonThin Solid Films, 1986
- Recent advances in the field of ion-induced kinetic electron emission from solidsVacuum, 1983
- Preparation and properties of hard i-C and i-BN coatingsThin Solid Films, 1982
- Ion-induced electron emission from clean metalsSurface Science, 1979
- Some characteristics and uses of low-pressure plasmas in materials scienceJournal of Vacuum Science and Technology, 1977
- The deposition of hard surface layers by hydrocarbon cracking in a glow dischargeThin Solid Films, 1976
- Fundamentals of Ion PlatingJournal of Vacuum Science and Technology, 1973