Wetting phenomena on rough substrates
- 1 October 1990
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review B
- Vol. 42 (10) , 6546-6554
- https://doi.org/10.1103/physrevb.42.6546
Abstract
We consider wetting phenomena in the vicinity of rough substrates. The quenched random geometry of the substrate is assumed to be a self-affine fractal with a roughness exponent of . Asymptotic critical properties on approaching complete and critical wetting transitions are studied by combining the replica method with scaling and renormalization-group arguments. We find new critical behavior, controlled by a zero-temperature fixed point, when exceeds the thermal roughness exponent of the emerging wetting layer. The possibility of an effective dimensional reduction due to randomness is considered. In two dimensions a number of exact results are obtained by using a many-body transfer-matrix technique.
Keywords
This publication has 19 references indexed in Scilit:
- Multilayer adsorption on a fractally rough surfacePhysical Review Letters, 1989
- Complete Wetting on Rough Surfaces: StaticsEurophysics Letters, 1988
- Third sound and capillary condensation on a fractal surfacePhysical Review B, 1986
- Wetting of a Disordered Substrate: Exact Critical Behavior in Two DimensionsPhysical Review Letters, 1986
- Wetting in random systemsPhysical Review Letters, 1986
- Interface wandering in adsorbed and bulk phases, pure and impureJournal of the Chemical Society, Faraday Transactions 2: Molecular and Chemical Physics, 1986
- Depinning by Quenched RandomnessPhysical Review Letters, 1985
- Wetting of a disordered substratePhysical Review B, 1985
- Critical Wetting in Three DimensionsPhysical Review Letters, 1983
- Pinning and roughening of one-dimensional models of interfaces and stepsPhysical Review B, 1981