nm-Co2Si, CoSi and CoSi2 silicide films from the single source precursor CoSiCl3(CO)4 in the presence of SiH4
- 1 January 2000
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 359 (1) , 39-45
- https://doi.org/10.1016/s0040-6090(99)00654-9
Abstract
No abstract availableKeywords
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