Observation of (5×5) Surface Reconstruction on Pure Silicon and its Stability Against Native-Oxide Formation
- 15 September 1986
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 57 (11) , 1332-1335
- https://doi.org/10.1103/physrevlett.57.1332
Abstract
We report the observation of a (5×5) reconstruction on the pure Si (111) surface, which is induced and stabilized by a tensile strain. The stabilization is so strong that the reconstruction survives extended exposure to air and the formation of a native oxide layer. Modeling of experimental high-resolution transmission-electron-microscope profile images indicates that the native oxide is ordered. The (5×5) reconstruction can also be induced at an initially unreconstructed Si-oxide interface by application of tension and appropriate annealing.Keywords
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