Highly carbon-doped p-type Ga0.5In0.5As and Ga0.5In0.5P by carbon tetrachloride in gas-source molecular beam epitaxy

Abstract
Highly carbon‐doped, highly p‐type Ga0.5In0.5As and Ga0.5In0.5P epilayers were grown by gas‐source molecular beam epitaxy (GSMBE) using carbon tetrachloride (CCl4). Growth temperatures slightly below conventional values were used to increase the carbon incorporation, and a short‐duration post‐growth anneal near the growth temperature was necessary in order to obtain the highest hole concentrations, which were p=3×1019 cm−3 for Ga0.5In0.5As and p=5×1018 cm−3 for Ga0.5In0.5P. This is the first report of significant p‐type carbon doping for Ga0.5In0.5P and the highest concentration from carbon doping yet reported for both ternary compounds. Reversible acceptor passivation from hydrogen species in the growth environment is a plausible explanation for the annealing behavior.