Annealing of silicon nitride thin films prepared by plasma-enhanced chemical vapor deposition with helium dilution
- 10 December 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 221 (1-2) , 65-71
- https://doi.org/10.1016/0040-6090(92)90797-f
Abstract
No abstract availableKeywords
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