Influence of substrate treatments on diamond thin film nucleation
Open Access
- 1 May 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 212 (1-2) , 63-67
- https://doi.org/10.1016/0040-6090(92)90501-2
Abstract
No abstract availableKeywords
Funding Information
- U.S. Department of Energy (DE-FG05-88ER45345)
This publication has 6 references indexed in Scilit:
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- Growth of diamond particles in chemical vapor depositionJournal of Materials Research, 1991
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- The deposition of diamond films by filament techniquesJournal of Vacuum Science & Technology A, 1990
- Nucleation enhancement of diamond synthesized by combustion flame techniquesApplied Physics Letters, 1990
- Deuterium passivation of grain-boundary dangling bonds in silicon thin filmsApplied Physics Letters, 1982