Novel Photoimaging Schemes at Polymer Surfaces: Their Role in High Resolution Lithography
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 21 references indexed in Scilit:
- The future of subhalf-micrometer optical lithographyMicroelectronic Engineering, 1987
- New, deep UV resist (LMR) for lift-off techniqueJournal of Vacuum Science & Technology B, 1985
- A "Precharged" Positive Plate for the Lead–Acid Automotive Battery: I . Positive Plate Allowing Direct Incorporation ofJournal of the Electrochemical Society, 1984
- Polymer-Polymer InterdiffusionMRS Proceedings, 1984
- Organosilicon monomers for plasma-developed x-ray resistsJournal of Vacuum Science and Technology, 1981
- An ESCA study of the photo-oxidation of the surface of polystyrene filmPolymer Degradation and Stability, 1981
- Oxygen plasma removal of thin polymer filmsPolymer Engineering & Science, 1980
- Structure, Mechanism, and Reactivity of Organotin Carboxylate PolymersPublished by American Chemical Society (ACS) ,1980
- The Role of U.V. Light in the Inhibition of Electroless DepositionJournal of the Electrochemical Society, 1972
- The photooxidation of polymers. IV. A note on the coloration of polystyreneJournal of Applied Polymer Science, 1965