Ferroelectric PLZT thin films deposited by RF triode magnetron sputtering for spatial light modulators
- 24 December 2002
- conference paper
- Published by Institute of Electrical and Electronics Engineers (IEEE)
- Vol. 2, 675-678 vol.2
- https://doi.org/10.1109/isaf.1996.598109
Abstract
No abstract availableKeywords
This publication has 10 references indexed in Scilit:
- Effects of PLT-buffer layer on microstructures of sputtered PLZT thin films epitaxially grown on sapphireJournal of Materials Research, 1994
- Macro-effects of resputtering due to negative ion bombardment of growing thin filmsJournal of Materials Research, 1993
- Deposition and characterization of thin ferroelectric lead lanthanum zirconate titanate (PLZT) films on sapphire for spatial light modulators applicationsIEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control, 1991
- Preparation of Ferroelectric (Pb, La)(Zr, Ti)O3 Thin Films by Sol-Gel Process and Dielectric PropertiesJapanese Journal of Applied Physics, 1991
- Properties of ion beam deposited Pb1−xLax(ZryTiz)1−x/4O3Journal of Vacuum Science & Technology A, 1989
- Ferroelectric (Pb,La)(Zr,Ti)O3 epitaxial thin films on sapphire grown by rf-planar magnetron sputteringJournal of Applied Physics, 1986
- rf planar magnetron sputtering and characterization of ferroelectric Pb(Zr,Ti)O3 filmsJournal of Applied Physics, 1983
- Dielectric Properties of PLZT Epitaxial Thin FilmsJapanese Journal of Applied Physics, 1983
- Epitaxial growth of ferroelectric PLZT thin film and their optical propertiesApplied Physics A, 1980
- Hot‐Pressed (Pb,La)(Zr,Ti)O3 Ferroelectric Ceramics for Electrooptic ApplicationsJournal of the American Ceramic Society, 1971