Microstructure of Sputtered High-Coercive Fe-Pt Alloy Thin Films
- 1 December 1993
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Translation Journal on Magnetics in Japan
- Vol. 8 (12) , 875-880
- https://doi.org/10.1109/tjmj.1993.4565765
Abstract
Fe-Pt alloy thin films were prepared by the rf-magnetron sputtering method. From X-ray diffraction results and TEM observations, the following results were obtained: (1) the as-deposited films are disordered and consist of micrograins of size roughly 150~200 Å; (2) the annealed films are ordered, with grain sizes about 400~500 Å. A lamellar microstructure, which is considered to be a microtwin structure, was observed within the grains. Magnetization measurements revealed that the coercive force, H c , of the annealed films has a maximum (≈15.8 kOe) at about equiatomic concentration. The origin of the high H c is considered to be related to the microtwin structure. It was found that H c begins to increase at an annealing temperature of 300°C, which means that the ordered phase begins to grow at the same temperature. The magnetization, M, of the annealed films was smaller than that of as-deposited films. The decrease in M near equiatomic composition is ascribed to a change in the magnetic structure.Keywords
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