High-sensitivity surface micromachined structures for internal stress and stress gradient evaluation
- 1 March 1997
- journal article
- Published by IOP Publishing in Journal of Micromechanics and Microengineering
- Vol. 7 (1) , 30-36
- https://doi.org/10.1088/0960-1317/7/1/006
Abstract
No abstract availableKeywords
This publication has 5 references indexed in Scilit:
- Stress gradient and structural properties of atmospheric and reduced pressure deposited polysilicon layers for micromechanical sensorsSensors and Actuators A: Physical, 1995
- Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applicationsThin Solid Films, 1995
- Comparison of techniques for measuring both compressive and tensile stress in thin filmsSensors and Actuators A: Physical, 1993
- Influence of surface coatings on elasticity, residual stresses, and fracture properties of silicon microelementsJournal of Applied Physics, 1989
- A simple technique for the determination of mechanical strain in thin films with applications to polysiliconJournal of Applied Physics, 1985