Power transfer efficiency and mode jump in an inductive RF discharge
- 1 February 1998
- journal article
- Published by IOP Publishing in Plasma Sources Science and Technology
- Vol. 7 (1) , 13-20
- https://doi.org/10.1088/0963-0252/7/1/003
Abstract
A large-diameter (50 cm) high-density plasma is produced in a few mTorr argon by inductive RF discharge using a conventional external antenna or a plasma-immersed internal antenna. A power transfer efficiency, i.e., the ratio of net power deposited into plasma to total power into the matching circuits, is measured as a function of the electron density based on a test antenna method. The measured density dependence of the power efficiency is well described by an equivalent circuit where both inductive and capacitive couplings are included with stochastic power deposition process taken into account. The internal antenna, for the conditions studied, has higher power efficiency than the external antenna and enables a stable discharge at low pressures without density jump. The density jump observed in the external antenna discharge is attributed to the mode transition between a capacitive discharge and an inductive discharge. A mechanism of the density jump is successfully explained in terms of the density dependence of the power transfer efficiency.Keywords
This publication has 14 references indexed in Scilit:
- Simulation of kinetic effects in inductive dischargesPlasma Sources Science and Technology, 1996
- Inductive plasmas for plasma processingPlasma Sources Science and Technology, 1996
- New Inductive rf Discharge Using an Internal Metal AntennaJapanese Journal of Applied Physics, 1995
- Investigation of electron source and ion flux uniformity in high plasma density inductively coupled etching tools using two-dimensional modelingJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 1994
- Electrical characteristics and electron heating mechanism of an inductively coupled argon dischargePlasma Sources Science and Technology, 1994
- Plasma processingIEEE Transactions on Plasma Science, 1994
- Collisionless electron heating in an inductively coupled dischargePhysical Review Letters, 1993
- A simple analysis of an inductive RF dischargePlasma Sources Science and Technology, 1992
- Review of inductively coupled plasmas for plasma processingPlasma Sources Science and Technology, 1992
- RF Plasma Production at Ultralow Pressures with Surface Magnetic ConfinementJapanese Journal of Applied Physics, 1990