RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement
- 1 June 1990
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 29 (6A) , L1015-1018
- https://doi.org/10.1143/jjap.29.l1015
Abstract
A 13.56 MHz rf inductively coupled plasma was maintained at pressures as low as 2.7×10-3 Pa (2×10-5 Torr) with the use of multidipole magnetic confinement. When more than 90% of the inner wall area was covered with surface magnetic fields, the plasma potential drastically decreased from 80 V to 20 V. These observations were consistent with ambipolar diffusion in partially magnetized plasmas. Additional potential control by an externally biased target was possible over a wide range without changing the plasma density. This large-diameter plasma at very low neutral pressures is promising for new plasma processing techniques.Keywords
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