Selective chemical etching of hexagonal boron nitride compared to cubic boron nitride
- 1 February 1997
- journal article
- Published by Springer Nature in Journal of Materials Research
- Vol. 12 (2) , 412-415
- https://doi.org/10.1557/jmr.1997.0060
Abstract
A BN film containing comparable amounts of sp2 and sp3 phases was subjected to a gas-phase chemical etch in a hot-filament environment containing 1% CH4 in H2. After a partial etch, examination by FTIR shows that the sp2 was preferentially etched, leaving a larger sp3 fraction than in the unetched film. The possibility that preferential etching could be used to increase the purity of cBN films is discussed.Keywords
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