Deposition and characterization of gold thin films on Si by CF4+O2 gas microwave plasma
- 1 July 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 16 (4) , 2042-2046
- https://doi.org/10.1116/1.581308
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Surface Morphology and Line Fill Properties of Gold Grown by Organometallic Chemical Vapor DepositionJapanese Journal of Applied Physics, 1992
- Chemical Vapor Deposition of GoldJournal of the Electrochemical Society, 1987
- Laser chemical vapor deposition of gold: Part IIJournal of Vacuum Science & Technology B, 1986
- Laser chemical vapor deposition of goldApplied Physics Letters, 1985