Thermal stability of cobalt and nickel silicides
- 1 September 1998
- journal article
- Published by Elsevier in Microelectronics Reliability
- Vol. 38 (9) , 1495-1498
- https://doi.org/10.1016/s0026-2714(98)00045-6
Abstract
No abstract availableKeywords
This publication has 6 references indexed in Scilit:
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- Formation and stability of silicides on polycrystalline siliconMaterials Science and Engineering: R: Reports, 1996
- Degradation mechanisms and improvement of thermal stability of CoSi2/polycrystalline Si layersApplied Physics Letters, 1994
- Spatially confined nickel disilicide formation at 400 °C on ion implantation preamorphized siliconApplied Physics Letters, 1993
- Thermal Stability of CoSi2 on Single Crystal and Polycrystalline SiliconMRS Proceedings, 1990