To the role of positive ions in plasma nitridation
- 1 February 1976
- journal article
- Published by Springer Nature in Czechoslovak Journal of Physics
- Vol. 26 (2) , 157-163
- https://doi.org/10.1007/bf01595350
Abstract
No abstract availableKeywords
This publication has 28 references indexed in Scilit:
- Über die Oxydation des Kaliumjodats im SauerstoffplasmaCollection of Czechoslovak Chemical Communications, 1973
- The Anodization of Si in an RF PlasmaJournal of the Electrochemical Society, 1973
- NEGATIVE ION EXTRACTION FROM THE PLASMA DURING ANODIZATION IN THE dc OXYGEN DISCHARGEApplied Physics Letters, 1971
- Plasma Anodization of Metals and SemiconductorsJournal of Vacuum Science and Technology, 1970
- Controlled oxidation of tantalum and aluminium in a radio-frequency-excited glow dischargeBritish Journal of Applied Physics, 1967
- Gas Phase Anodization of TantalumJournal of the Electrochemical Society, 1967
- Oxide Films Grown on GaAs in an Oxygen PlasmaJournal of Applied Physics, 1966
- Silicon Oxidation in an Oxygen Plasma Excited by MicrowavesJournal of Applied Physics, 1965
- Plasma Anodized Aluminum Oxide FilmsJournal of the Electrochemical Society, 1964
- The Formation of Metal Oxide Films Using Gaseous and Solid ElectrolytesJournal of the Electrochemical Society, 1963