Electromigration mechanism in aluminium conductors
- 31 May 1980
- journal article
- Published by Elsevier in Solid-State Electronics
- Vol. 23 (5) , 481-485
- https://doi.org/10.1016/0038-1101(80)90085-4
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- A Review of the Limitations of Aluminum Thin Films on Semiconductor DevicesIEEE Transactions on Parts, Hybrids, and Packaging, 1975
- Dependence of Electromigration-Induced Failure Time on Length and Width of Aluminum Thin-Film ConductorsJournal of Applied Physics, 1970
- Electromigration Damage in Aluminum Film ConductorsJournal of Applied Physics, 1970
- Electromigration—A brief survey and some recent resultsIEEE Transactions on Electron Devices, 1969
- Electromigration in Thin Al FilmsJournal of Applied Physics, 1969
- Electromigration failure modes in aluminum metallization for semiconductor devicesProceedings of the IEEE, 1969
- Current-induced marker motion in gold wiresJournal of Physics and Chemistry of Solids, 1961
- Diffusion of Aluminum, Magnesium, Silicon, and Zirconium in NickelJournal of Applied Physics, 1959