Fabrication of amorphous silicon materials and solar cells at high temperatures using ECR deposition techniques
- 1 December 1993
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 164-166, 71-74
- https://doi.org/10.1016/0022-3093(93)90494-i
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Stability of hydrogenated amorphous silicon deposited at high temperatures with a remote hydrogen plasmaApplied Physics Letters, 1991
- Deposition of device quality, low H content amorphous siliconJournal of Applied Physics, 1991
- A critical investigation of a-Si:H photoconductivity generated by subgap absorption of lightJournal of Non-Crystalline Solids, 1989
- Amorphous silicon p-i-n solar cells with graded interfaceApplied Physics Letters, 1986