Dry etching of InGaAlP alloys in Cl2/Ar high ion density plasmas
- 1 September 1996
- journal article
- research article
- Published by Springer Nature in Journal of Electronic Materials
- Vol. 25 (9) , 1428-1433
- https://doi.org/10.1007/bf02655378
Abstract
No abstract availableThis publication has 30 references indexed in Scilit:
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