Low temperature deposition of α-Al2O3 thin films by sputtering using a Cr2O3 template
- 1 November 2002
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology A
- Vol. 20 (6) , 2134-2136
- https://doi.org/10.1116/1.1513641
Abstract
No abstract availableKeywords
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