Influence of coating parameters on the structure and properties of Al2O3 layers reactively deposited by means of pulsed magnetron sputtering
- 20 June 2001
- journal article
- Published by Elsevier
- Vol. 86-87, 640-647
- https://doi.org/10.1016/s0257-8972(96)02992-1
Abstract
No abstract availableKeywords
This publication has 11 references indexed in Scilit:
- Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputteringSurface and Coatings Technology, 1996
- Pulsed magnetron sputter technologySurface and Coatings Technology, 1993
- Phase transformation in chemically vapour-deposited κ-aluminaThin Solid Films, 1992
- Electronic Band Structure of Al2O3, with Comparison to Alon and AINJournal of the American Ceramic Society, 1990
- A review of the present state of art in hard coatings grown from the vapor phaseJournal of Vacuum Science & Technology A, 1986
- Preparation of alumina coatings by chemical vapour depositionThin Solid Films, 1986
- Alumina deposition by activated reactive evaporationThin Solid Films, 1977
- Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2SystemJapanese Journal of Applied Physics, 1972
- A spectroscopic investigation of the reactive sputtering of aluminiumThin Solid Films, 1971
- Transitions in Vapor‐Deposited Alumina from 300° to 1200°CJournal of the American Ceramic Society, 1967