Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering
- 31 July 1996
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 82 (1-2) , 169-175
- https://doi.org/10.1016/0257-8972(95)00270-7
Abstract
No abstract availableKeywords
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