A new experimental approach to investigate the kinetics of low energy electron attachment reactions

This publication has 32 references indexed in Scilit:

• Thermal electron attachment to SF4 and SF6
  The Journal of Chemical Physics, 1994
• Studies of Electron Attachment at Thermal Energies Using the Flowing Afterglow–Langmuir Probe Technique
  Published by Elsevier ,1994
• Formation of Br−2 in the reactions of thermal electrons with some bromomethanes and bromoethanes
  International Journal of Mass Spectrometry and Ion Processes, 1990
• Studies of dissociative electron attachment to some haloethanes using the falp apparatus: comparisons with data obtained using non-thermal techniques
  International Journal of Mass Spectrometry and Ion Processes, 1989
• s-wave threshold in electron attachment: Observations and cross sections inCCl4andSF6at ultralow electron energies
  Physical Review A, 1985
• Rate coefficients for the attachment reactions of electrons with c-C₇F₁₄, CH₃Br, CF₃Br, CH₂Br₂and CH₃I determined between 200 and 600K using the FALP technique
  Journal of Physics B: Atomic and Molecular Physics, 1984
• Attachment coefficients for the reactions of electrons with CCl₄, CCl₃F, CCl₂F₂, CHCl₃, Cl₂and SF₆determined between 200 and 600 K using the FALP technique
  Journal of Physics B: Atomic and Molecular Physics, 1984
• Experimental S${\mathrm{F}}_6^{-}$/S${\mathrm{F}}_6$ and ${\mathrm{Cl}}^{-}$/CF${\mathrm{Cl}}_3$ Electron-Attachment Cross Sections in the Energy Range 0-200 meV
  Physical Review Letters, 1981
• Photon-enhanced dissociative electron attachment in SF6 and its isotopic selectivity
  The Journal of Chemical Physics, 1979
• Electron Attachment to SF6
  The Journal of Chemical Physics, 1970