Preparation of nanoscale amorphous silicon based powder in a square-wave-modulated rf plasma reactor
- 30 November 1994
- Vol. 45 (10-11) , 1115-1117
- https://doi.org/10.1016/0042-207x(94)90039-6
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Ellipsometric study of a-Si:H thin films deposited by square wave modulated rf glow dischargeJournal of Applied Physics, 1991
- Unifying model of thermal and light-induced degradations of a-Si:HSolar Energy Materials, 1990
- I n s i t u laser diagnostic studies of plasma-generated particulate contaminationJournal of Vacuum Science & Technology A, 1989
- Real time controlled rf reactor for deposition of a-Si:H thin filmsVacuum, 1989