Si(100) Surface under an Externally Applied Stress
- 21 November 1988
- journal article
- research article
- Published by American Physical Society (APS) in Physical Review Letters
- Vol. 61 (21) , 2469-2471
- https://doi.org/10.1103/physrevlett.61.2469
Abstract
Loading a cantilevered bar allows studying the effect of a uniform, externally applied, and continuously variable strain field on the properties of surfaces. Straining a nominally flat Si(100) surface produces unequal populations of the 2 × 1 and 1 × 2 domains. The domain compressed along the dimer bond is favored. The effect depends on the strain and not the strain gradient. The effect saturates at a strain of 0.1% when 90% of the surface is in the favorable domain. The kinetics of developing and annealing away the asymmetry are identical and thermally activated.Keywords
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