Thermopower of amorphous Si(Al)
- 1 February 1982
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 47 (3) , 355-362
- https://doi.org/10.1016/0022-3093(82)90211-3
Abstract
No abstract availableKeywords
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- Doping, Schottky barrier and pn junction formation in amorphous germanium and silicon by rf sputteringSolid State Communications, 1976
- Effect of hydrogen on amorphous siliconSolid State Communications, 1976